Comdel
RPMX Monitor
and Control System
When
you monitor your process from you power source, you know what power levels you
are sending out, but you don't know what is actually getting to your plasma chamber.
Any number of variables in your system can cause your delivered power levels to
be different from the power levels at the source. These differences can
radically affect the repeatability of your processes, not to mention those of
your profits. Luckily, Comdel
has come to the rescue. Using our own patented design, Comdel has developed
the RPMX monitor. It attaches directly to the plasma chamber to measure
RF parameters... and gives you the ultimate in profitability.
Accept
No Substitutes! Comdel
holds the patent to this breakthrough technology that will enable you to increase
yields and reduce system downtime. Before the RPMX, power control accuracy
and repeatability was only specified into a 50 Ohm load. But Comdel's new
technology enables you to control the RF power source based on the real delivered
power, RF voltage, RF current, or DC bias, regardless of the load impedance. How
It Works The RPMX is made
up of two units, the Sensor Unit and the Processor Unit, which work together to
give you greater precision and repeatable results. The
Sensor Unit The Sensor
Unit is placed in the transmission line, as close to the plasma chamber as possible.
The Sensor contains a DC bias tap, an RF current and an RF voltage tap.
The primary function of the Sensor Unit is to convert 13.56MHz RF voltage and
current waveforms existing at the reactor terminal into accurate, low frequency
representations of those parameters while preserving phase relationships. The
Processor Unit The
Processor Unit multiplies the low frequency analog signals to obtain real power
and performs an RMS conversion on the signals. It also calculates the plasma
load impedance magnitude and phase angle at the Sensor Unit, and automatically
adjusts the RF power source to maintain a steady power level at the plasma chamber.
Regardless of impedance levels of variations in the system, the power in the plasma
chamber remains constant. Repeatability
in you plasma chamber process is the key to profitability in your business.
The more repeatable the results are, the lower your error rate will be, the lower
your downtime will be - and the higher your profits will be.
| The
RPMX Eliminates Costly Variances and Improves Power Control |
| Eliminates
power accuracy errors at the power source |
| Eliminates
loss variations due to load impedance changes |
| Eliminates
RFG sensor errors due to RF signal modulation and harmonic distortion |
| Eliminates
fixed and variable transmission line losses |
| Eliminates
matching network tuning window errors | | Eliminates
fixed and variable matching network losses |
| The
RPMX Reduces System Downtime and Improves Process Efficiency |
| By
monitoring RF electrical parameters near the plasma load, you benefit from increased
accuracy in your diagnostic data. This data can be used to detect minute
changes in the plasma load impedance, which can indicate problems or deviances
in the pressure or gas flow conditions, or even in the process gas composition
itself. | | As
some etch processes reach endpoint, plasma impedance changes could give supporting
data for endpoint detection. |
General
Specifications: Processor
Unit - Accuracy:
5% absolute to 85 degree phase angles, 3% repeatability to 85 degrees
- Size:
3.5"H x 9.5"W x 6.625"D
- Weight:
5 lbs
- Power: 100-130
VAC 50/60 Hz
- Cooling:
Ambient, 1" min top clearance
Connectors:
- Sensor
Unit interface: Submin D 9 pin Female
- RF
generator interface: Submin D 15 pin Female & Submin D 25 pin Female
- RF Host Control analog interface:
Submin D 15 pin Male & Submin D 25 pin Male
- Serial
port: Submin D 9 pin Female
- RF
voltage monitor output: BNC
- RF
current monitor output: BNC
Outputs:
- RF
voltage monitor: 5VRMS max, 4.7K Ohm
- RF
current monitor: 5VRMS max, 4.7K Ohm
Communication
Port:
- DCE, 300-57.6Kbaud, 1 or 2 stop bits,
7 or 8 data bits, E/O/N parity, dip-switch selectable
Cables:
- AC
power: 7', USA domestic standard
- Sensor
Unit interface: 5', 9 conductor,, 2 lines shielded, overall shielded,
Submin D 15 pin Male connectors
Sensor
Unit: - Size (less connectors):
2"W x 2.5"H x 3.75"D
- Weight:
1 LB
- Power: Supplied
by Processor Unit
- RF voltage:
1 kV RMS max
- RF current:
20 amps RMS max
- Cooling:
Ambient
- Operating Frequency:
13.56 MHz +/- 6 kHz (custom, fixed frequencies also available)
- Bandwidth:
50 MHz
Connectors:
- RF: Type N, C, UHF, HN, LC,
or 3/8"-16 by .75"
- Processor
Unit Interface: Submin D 9 pin Female
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11 Kondelin Road, Gloucester,
MA 01930 | 978-282-0620 800-468-3144
| Fax: 978-282-4980
E-Mail:info@comdel.com
© 2004 Comdel, Inc.
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