Comdel
RPMX Monitor
and Control System
When you monitor your process from you power source,
you know what power levels you are sending out, but you don't know what is actually
getting to your plasma chamber. Any number of variables in your system can cause
your delivered power levels to be different from the power levels at the source.
These differences can radically affect the repeatability of your processes, not to mention
those of your profits.
Luckily, Comdel has come to the rescue. Using
our own patented design, Comdel has developed the RPMX monitor. It attaches directly
to the plasma chamber to measure RF parameters... and gives you the ultimate in
profitability.
Accept
No Substitutes!
Comdel holds the patent to this breakthrough
technology that will enable you to increase yields and reduce system downtime.
Before the RPMX, power control accuracy and repeatability was only specified into a 50 Ohm
load. But Comdel's new technology enables you to control the RF power source based
on the real delivered power, RF voltage, RF current, or DC bias, regardless of the load
impedance.
How It Works
The RPMX is made up of two units, the Sensor Unit
and the Processor Unit, which work together to give you greater precision and repeatable
results.
The Sensor Unit
The Sensor Unit is placed in the transmission line,
as close to the plasma chamber as possible. The Sensor contains a DC bias tap, an RF
current and an RF voltage tap. The primary function of the Sensor Unit is to convert
13.56MHz RF voltage and current waveforms existing at the reactor terminal into accurate,
low frequency representations of those parameters while preserving phase relationships.
The Processor Unit
The Processor Unit multiplies the low frequency
analog signals to obtain real power and performs an RMS conversion on the signals.
It also calculates the plasma load impedance magnitude and phase angle at the Sensor Unit,
and automatically adjusts the RF power source to maintain a steady power level at the
plasma chamber. Regardless of impedance levels of variations in the system,
the power in the plasma chamber remains constant.
Repeatability in you plasma chamber process is the
key to profitability in your business. The more repeatable the results are, the
lower your error rate will be, the lower your downtime will be - and the higher your
profits will be.
| The
RPMX Eliminates Costly Variances and Improves
Power Control |
| Eliminates
power accuracy errors at the power source |
| Eliminates
loss variations due to load impedance changes |
| Eliminates
RFG sensor errors due to RF signal modulation and harmonic
distortion |
| Eliminates
fixed and variable transmission line losses |
| Eliminates
matching network tuning window errors |
| Eliminates
fixed and variable matching network losses |
| The
RPMX Reduces System Downtime and Improves Process Efficiency |
| By
monitoring RF electrical parameters near the plasma load,
you benefit from increased accuracy in your diagnostic data.
This data can be used to detect minute changes in the plasma
load impedance, which can indicate problems or deviances in
the pressure or gas flow conditions, or even in the
process gas composition itself. |
| As
some etch processes reach endpoint, plasma impedance changes
could give supporting data for endpoint detection. |
General Specifications:
Processor Unit
- Accuracy: 5% absolute
to 85 degree phase angles, 3% repeatability to 85 degrees
- Size: 3.5"H x
9.5"W x 6.625"D
- Weight: 5 lbs
- Power: 100-130 VAC
50/60 Hz
- Cooling: Ambient,
1" min top clearance
Connectors:
- Sensor Unit interface:
Submin D 9 pin Female
- RF generator interface:
Submin D 15 pin Female & Submin D 25 pin Female
- RF Host Control analog interface:
Submin D 15 pin Male & Submin D 25 pin Male
- Serial port: Submin
D 9 pin Female
- RF voltage monitor output:
BNC
- RF current monitor output:
BNC
Outputs:
- RF voltage monitor:
5VRMS max, 4.7K Ohm
- RF current monitor:
5VRMS max, 4.7K Ohm
Communication Port:
- DCE, 300-57.6Kbaud, 1 or
2 stop bits, 7 or 8 data bits, E/O/N parity, dip-switch selectable
Cables:
- AC power:
7', USA domestic standard
- Sensor Unit interface:
5', 9 conductor,, 2 lines shielded, overall shielded, Submin
D 15 pin Male connectors
Sensor Unit:
- Size (less connectors):
2"W x 2.5"H x 3.75"D
- Weight: 1 LB
- Power: Supplied
by Processor Unit
- RF voltage:
1 kV RMS max
- RF current:
20 amps RMS max
- Cooling: Ambient
- Operating Frequency:
13.56 MHz +/- 6 kHz (custom, fixed frequencies also available)
- Bandwidth: 50
MHz
Connectors:
- RF: Type
N, C, UHF, HN, LC, or 3/8"-16 by .75"
- Processor Unit Interface:
Submin D 9 pin Female
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11 Kondelin
Road, Gloucester, MA 01930 | 978-282-0620
800-468-3144 | Fax: 978-282-4980
E-Mail:info@comdel.com
©
2004 Comdel, Inc.
|