CLF Series Low Frequency
Power Supplies Stable, Reliable, Low Frequency Power
for Industrial Heating and Plasma
Processing Applications
Performance: The CLF series generators provide stable process power up to 5 kW. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz. The full- rack models can operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications: The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.
Features:
Output power leveled on delivered power
No preventative maintenance required, maximum generator uptime
Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
Fast auto-tune circuitry on full-rack models
CLF 5000 CE Marked and SEMI F47 compliant
Options:
Wide range of input line voltages available
Master/Slave operation available with full-rack models
Specifications:
Frequency stability: +/- 1%
Line regulation: £ 1% for +/- 10% line
Load regulation: £ 3% from 10-100% setpoint before foldback
Power readback vs. actual: £ 2%
Forward/Reflected power monitoring: 0-10 VDC for 0 to full-rated output
Spurious output: 30 dB below fundamental typical
Harmonic output: 20 dB below fundamental typical
Noise, hum ripple: +/- 1% at all power levels typical
